首页   按字顺浏览 期刊浏览 卷期浏览 Temperature Dependence of the Ag/Cu Sputtering Ratio for the Eutectic
Temperature Dependence of the Ag/Cu Sputtering Ratio for the Eutectic

 

作者: G. S. Anderson,  

 

期刊: Journal of Applied Physics  (AIP Available online 1969)
卷期: Volume 40, issue 7  

页码: 2884-2888

 

ISSN:0021-8979

 

年代: 1969

 

DOI:10.1063/1.1658094

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The relative sputtering rates of Ag and Cu from the Ag/Cu eutectic (60% Ag‐40% Cu by atoms) were measured by means of the spectroscopic emission technique. The targets were bombarded by 100‐eV Ar ions for target temperatures in the range of 80° to 285°C. At low target temperatures, the Ag and Cu sputtering yields vary with time of sputtering according to a simple sputtering model. However, at the higher temperatures surprisingly large differences were observed which could not be explained by a simple model. For example, Ag/Cu sputtering ratio variations greater than a factor of 10 were observed. After prolonged sputtering in the high‐temperature range, a thick surface layer (∼1 &mgr;) developed which was highly enriched in Cu. A model based on surface diffusion of Ag on Cu is proposed to explain the results.

 

点击下载:  PDF (434KB)



返 回