Electronic properties of sulfur adsorbed on cleaved GaAs surfaces
作者:
L. Koenders,
M. Blömacher,
W. Mönch,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena
(AIP Available online 1988)
卷期:
Volume 6,
issue 4
页码: 1416-1420
ISSN:0734-211X
年代: 1988
DOI:10.1116/1.584232
出版商: American Vacuum Society
关键词: SURFACE STATES;IMPURITY STATES;ADSORPTION;SORPTIVE PROPERTIES;FERMI LEVEL;IONIZATION;SULFUR;OXYGEN;CHLORINE;GALLIUM ARSENIDES;ADSORBATES;ACCEPTORS;AFFINITY;GaAs
数据来源: AIP
摘要:
The interaction of molecular S2with cleaved GaAs(110) surfaces was followed by using a Kelvin probe and ultraviolet photoemission spectroscopy. The adsorption of sulfur increases the ionization energy of the cleaved surfaces by up to 0.92 eV and causes a Fermi‐level pinning at 0.34 eV above the valence‐band top for both types of doping. The sign of the change of the ionization energy can be explained by a chemical charge transfer between the adsorbed sulfur and adsorbate‐induced gap states, since sulfur is more electronegative than GaAs. The sulfur‐related pinning position of the Fermi level is located below the charge‐neutrality level of the virtual gap states (ViGS) of the complex GaAs band structure, where the ViGS predominantly possess donor character. This result confirms the predictions from the ViGS model of adsorbate‐induced gap states. The energy of the sulfur as well as the oxygen‐ and chlorine‐related surface states, which are of the acceptor type, correlate with the respective atomic electron affinities.
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