The bottleneck in pseudospark discharges
作者:
T. Mehr,
R. Tkotz,
J. Stenzenberger,
G. Hintz,
J. Christiansen,
P. Felsner,
K. Frank,
M. Stetter,
期刊:
Journal of Applied Physics
(AIP Available online 1996)
卷期:
Volume 79,
issue 2
页码: 625-630
ISSN:0021-8979
年代: 1996
DOI:10.1063/1.362663
出版商: AIP
数据来源: AIP
摘要:
Physical mechanisms during early phases of pseudospark discharges are still under discussion. Experiments at low rates of current rise (dI/dt<109A/s) were performed to investigate these phenomena, using filtered fast shutter photography of the discharge plasma in the visible wavelength region. Additionally temporally resolved measurements of line emission of the filling gas (hydrogen and helium) and cathode material (copper) were performed. These experiments revealed a discharge phase where the cathode surface involved in the discharge is restricted mainly to the inside of the cathode aperture. The voltage drop during that phase is about 200–400 V and the current density exceeds 1 kA/cm2. A possible explanation of the discharge mechanisms during that discharge phase is self‐sputtering of cathode material from the cathode surface inside the cathode aperture. The described mechanisms might be fundamental for the transition from the transient hollow cathode phase to the high current phase in pseudospark discharges. ©1996 American Institute of Physics.
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