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Lattice contraction due to carbon doping of GaAs grown by metalorganic molecular beam epitaxy

 

作者: T. J. de Lyon,   J. M. Woodall,   M. S. Goorsky,   P. D. Kirchner,  

 

期刊: Applied Physics Letters  (AIP Available online 1990)
卷期: Volume 56, issue 11  

页码: 1040-1042

 

ISSN:0003-6951

 

年代: 1990

 

DOI:10.1063/1.102608

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Epitaxial layers of GaAs have been grown by metalorganic molecular beam epitaxy (MOMBE) with atomic carbon concentrations ranging from 4×1017to 3.5×1020cm−3. The dependences of GaAs lattice parameter and hole concentration on atomic carbon concentration have been determined from x‐ray diffraction, Hall effect, and secondary‐ion mass spectrometry measurements. For atomic carbon concentrations in excess of 1×1019cm−3, the hole concentrations are less than the corresponding atomic carbon concentrations. Lattice parameter shifts as large as 0.2% are observed for carbon concentrations in excess of 1×1020cm−3, which results in misfit dislocation generation in some cases due to the lattice mismatch between the C‐doped epilayer and undoped substrate. Over the entire range of carbon concentrations investigated, Vegard’s law accurately predicts the observed lattice contraction.

 

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