Periodic morphological modification developed on the surface of polyethersulfone by XeCl excimer laser photoablation
作者:
Hiroyuki Niino,
Masashi Nakano,
Shozaburo Nagano,
Akira Yabe,
Tetsuro Miki,
期刊:
Applied Physics Letters
(AIP Available online 1989)
卷期:
Volume 55,
issue 5
页码: 510-512
ISSN:0003-6951
年代: 1989
DOI:10.1063/1.101863
出版商: AIP
数据来源: AIP
摘要:
Periodic and stable micropatterns appeared on the surface of amorphous polyethersulfone etched with an excimer laser at 308 nm in ambient air and a vacuum. The control of such radiative conditions as fluence and incident angle enables us to modify the spacing and pattern of the microstructures. A topographical investigation with scanning electron microscopy and an experiment with x‐ray photoelectron spectroscopy to determine its composition is reported.
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