Characterization of GaAs/Ga1−xAlxAs heterojunction bipolar transistor structures using photoreflectance
作者:
X. Yin,
Fred H. Pollak,
L. Pawlowicz,
T. O’Neill,
M. Hafizi,
期刊:
Applied Physics Letters
(AIP Available online 1990)
卷期:
Volume 56,
issue 13
页码: 1278-1280
ISSN:0003-6951
年代: 1990
DOI:10.1063/1.102536
出版商: AIP
数据来源: AIP
摘要:
We have studied the photoreflectance spectra at 300 K from a number of GaAs/Ga1−xAlxAs heterojunction bipolar transistor (HBT) structures grown by molecular beam epitaxy and metalorganic chemical vapor deposition. From the observed Franz–Keldysh oscillations we have been able to evaluate the built‐in dc electric fieldsFdcin the Ga1−xAlxAs emitter as well as then−‐GaAs collector region. In addition, the Ga1−xAlxAs band gap (and hence Al composition) has been determined. The obtained values ofFdcare in good agreement with numerically computed values for the analyzed HBT structures, thus making it possible to deduce doping levels in these sections.
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