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A numerical approach to the study of the photomagnetoelectric effect for any injection level

 

作者: V. Augelli,   R. Piccolo,   A. Rizzo,   L. Vasanelli,  

 

期刊: Journal of Applied Physics  (AIP Available online 1982)
卷期: Volume 53, issue 3  

页码: 1554-1557

 

ISSN:0021-8979

 

年代: 1982

 

DOI:10.1063/1.330656

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The theoretical behavior of both the photomagnetoelectric (PME) effect short‐circuit currentIPMEand the photoconductance &Dgr;Gis studied as a function of the light intensity, for any injection level. This is carried out by assuming that in a semiconductor band gap, there are two energy levels which control the recombination kinetics. Also, the dependence of bothIPMEand &Dgr;Gon the light intensity is studied as a function of the illuminated surface recombination velocity.

 

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