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Properties of a vacuum ultraviolet laser created plasma sheet for a microwave reflector

 

作者: W. Shen,   J. E. Scharer,   N. T. Lam,   B. G. Porter,   K. L. Kelly,  

 

期刊: Journal of Applied Physics  (AIP Available online 1995)
卷期: Volume 78, issue 12  

页码: 6974-6979

 

ISSN:0021-8979

 

年代: 1995

 

DOI:10.1063/1.360773

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A 193 nm excimer laser and a custom fabricated cylindrical lens system is used to produce a plasma sheet of 8 cm×30 cm×0.4 cm in tetrakis(dimethylamino)ethylene (TMAE), a low ionization energy organic gas. Plasma density variation due to photon absorption is studied by scanning the filling pressure of TMAE between 12 and 150 mTorr. A high density (n≥2.0×1013cm−3), low temperature (Te≊0.8 eV) plasma sheet of 4 mm thickness is obtained with less than 50% spatial density variation over the 30 cm axial length. Charge recombination is found to be the dominant process for t≤1.2 &mgr;s with the plasma diffusion playing a perturbational role. A one‐dimensional plasma model is utilized to model the experimental plasma data by treating the diffusion as a perturbation. This study shows that the recombination coefficient is 1.8±0.1×10−7cm3 s−1and the diffusion coefficient is 2.8±0.4×104cm2 s−1. The plasma sheet has attractive properties for a microwave agile mirror. ©1995 American Institute of Physics.

 

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