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Gas-phase doping of silicon

 

作者: J.Goorissen,   A.M.J.G.Van Run,  

 

期刊: Proceedings of the IEE - Part B: Electronic and Communication Engineering  (IET Available online 1959)
卷期: Volume 106, issue 17S  

页码: 858-860

 

年代: 1959

 

DOI:10.1049/pi-b-2.1959.0159

 

出版商: IEE

 

数据来源: IET

 

摘要:

Single crystals of silicon doped with phosphorus and with a constant resistivity are prepared using a gas-phase doping technique. A constant flux of phosphorus atoms from the gas phase via the liquid into the solid is created by decomposing phosphine in the vicinity of the floating liquid zone.Experimental details and a discussion of the results obtained with phosphine are given.

 

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