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Modeling of ion-assisted deposition using BCA computer simulation

 

作者: W. Möller,  

 

期刊: Radiation Effects and Defects in Solids  （Taylor Available online 1994）
卷期: Volume 130-131, issue 1  

页码: 353-366

 

ISSN:1042-0150

 

年代: 1994

 

DOI:10.1080/10420159408219796

 

出版商: Taylor & Francis Group

 

关键词: Binary collision approximation;computer simulation;ion assisted deposition of thin films

 

数据来源: Taylor

 

摘要:

TRIM type binary collision approximation event store codes have employed to simulate collisional effects which occur during ion-beam or plasma assisted deposition of thin films.

 

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