Effect of ultraviolet light irradiation on amorphous carbon nitride films
作者:
Mei Zhang,
Yoshikazu Nakayama,
期刊:
Journal of Applied Physics
(AIP Available online 1997)
卷期:
Volume 82,
issue 10
页码: 4912-4915
ISSN:0021-8979
年代: 1997
DOI:10.1063/1.366356
出版商: AIP
数据来源: AIP
摘要:
The amorphous carbon nitride films were produced using electron cyclotron resonance nitrogen plasma with various mixtures ofN2andCH4gases. The dependence of film structures on the nitrogen incorporation and the structural modifications of the film due to ultraviolet (UV) light irradiation were investigated using infrared and UV-VIS spectroscopy. It is found that UV irradiation results in the decrease of CH bonding, increase of CC and CN double bonding in the film and increase of the optical band gap of the film. It appears that both bond removal and reordering have taken place as a result of UV irradiation. The structural modifications due to nitrogen incorporation and UV light irradiation are explained by a cluster model. ©1997 American Institute of Physics.
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