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Surface photoabsorption studies of the chemical structure of GaInP grown by organometallic vapor phase epitaxy

 

作者: H. Murata,   I. H. Ho,   T. C. Hsu,   G. B. Stringfellow,  

 

期刊: Applied Physics Letters  (AIP Available online 1995)
卷期: Volume 67, issue 25  

页码: 3747-3749

 

ISSN:0003-6951

 

年代: 1995

 

DOI:10.1063/1.115370

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The surface structure ofGa0.52In0.48Pwas studied by surface photoabsorption. An absorption peak due to P dimers onGa0.52In0.48Pwas observed at ∼400 nm, shorter than for InP (430 nm). From comparison with results for GaAs and InP, the data are interpreted to indicate that at a tertiarybutylphosphine (TBP) pressure of 50 Pa for temperatures below 670 °C, the P‐stabilized surface has P dimers aligned along the [1¯10] direction, i.e., it has a (2×4)‐like structure. Above 670 °C, the 400 nm peak due to the P‐dimer structure disappears because of P desorption from the surface at this TBP partial pressure. EpitaxialGa0.52In0.48Players grown using TBP, trimethylgallium and ethyldimethylindium are nearly disordered at 670 °C and highly ordered at 620 °C. These data suggest a correlation between surface structure and ordering. ©1995 American Institute of Physics.

 

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