MOVING MASK GROWTH OF SINGLE‐CRYSTAL SILICON FILMS ON AMORPHOUS QUARTZ SUBSTRATES
作者:
M. Braunstein,
R. R. Henderson,
A. I. Braunstein,
期刊:
Applied Physics Letters
(AIP Available online 1968)
卷期:
Volume 12,
issue 3
页码: 66-67
ISSN:0003-6951
年代: 1968
DOI:10.1063/1.1651901
出版商: AIP
数据来源: AIP
摘要:
We have combined vapor‐liquid‐solid mechanisms with a moving‐mask‐growth technique in a study of the nucleation and condensation of single‐crystal silicon films deposited on amorphous dielectric substrates by vacuum evaporation of silicon. Using this VLS‐MMG approach we have grown silicon single crystals up to 50 × 300 &mgr; in lateral dimension on fused quartz substrates at substrate temperatures of 800 to 900°C.
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