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Epitaxial growth of metastable SnGe alloys

 

作者: M. T. Asom,   E. A. Fitzgerald,   A. R. Kortan,   B. Spear,   L. C. Kimerling,  

 

期刊: Applied Physics Letters  (AIP Available online 1989)
卷期: Volume 55, issue 6  

页码: 578-579

 

ISSN:0003-6951

 

年代: 1989

 

DOI:10.1063/1.101838

 

出版商: AIP

 

数据来源: AIP

 

摘要:

We have grown homogeneous alloys of Sn1−xGexwith 0.01<x<0.1 by molecular beam epitaxy on ⟨100⟩ InSb substrates. The Sn‐Ge system is immiscible due to differing equilibrium crystal structures at the growth temperature. By stabilizing the diamond cubic &agr;‐Sn with the InSb template, we have created a metastable miscibility region for alloying Sn and Ge. Pure &agr;‐Sn grown on ⟨100⟩ InSb shows a tetragonal expansion perpendicular to the substrate because of the slightly larger lattice parameter of &agr;‐Sn. As the smaller Ge atom is added, the strain converts from compressive to tension resulting in an effective 1.66% tetragonal contraction in the growth direction for Sn0.92Ge0.08.

 

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