Epitaxial growth of metastable SnGe alloys
作者:
M. T. Asom,
E. A. Fitzgerald,
A. R. Kortan,
B. Spear,
L. C. Kimerling,
期刊:
Applied Physics Letters
(AIP Available online 1989)
卷期:
Volume 55,
issue 6
页码: 578-579
ISSN:0003-6951
年代: 1989
DOI:10.1063/1.101838
出版商: AIP
数据来源: AIP
摘要:
We have grown homogeneous alloys of Sn1−xGexwith 0.01<x<0.1 by molecular beam epitaxy on 〈100〉 InSb substrates. The Sn‐Ge system is immiscible due to differing equilibrium crystal structures at the growth temperature. By stabilizing the diamond cubic &agr;‐Sn with the InSb template, we have created a metastable miscibility region for alloying Sn and Ge. Pure &agr;‐Sn grown on 〈100〉 InSb shows a tetragonal expansion perpendicular to the substrate because of the slightly larger lattice parameter of &agr;‐Sn. As the smaller Ge atom is added, the strain converts from compressive to tension resulting in an effective 1.66% tetragonal contraction in the growth direction for Sn0.92Ge0.08.
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