InAlAs/InGaAs high electron mobility transistors on low temperature InAlAs buffer layers by metalorganic chemical vapor deposition
作者:
N. Pan,
J. Elliott,
H. Hendriks,
L. Aucoin,
P. Fay,
I. Adesida,
期刊:
Applied Physics Letters
(AIP Available online 1995)
卷期:
Volume 66,
issue 2
页码: 212-214
ISSN:0003-6951
年代: 1995
DOI:10.1063/1.113137
出版商: AIP
数据来源: AIP
摘要:
InAlAs/InGaAs high electron mobility transistors (HEMT) with excellent high frequency performance were demonstrated. Device sizes of 0.25×50 &mgr;m and 0.10×50 &mgr;m showed current gain cutoff frequencies of 143 and 205 GHz, respectively. The HEMT structures were grown on a low temperature InAlAs buffer layers designed to eliminate conductive impurity spikes situated at the epitaxial/substrate interface. The highly resistive buffer layer (2×105&OHgr; cm) was obtained at a growth temperature of 475 °C using a combination of trimethylarsenic and arsine as the arsenic sources. ©1995 American Institute of Physics.
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