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Ultrafast characterization of an in‐plane gate transistor integrated with photoconductive switches

 

作者: K. Ogawa,   J. Allam,   N. de B. Baynes,   J. R. A. Cleaver,   T. Mishima,   I. Ohbu,  

 

期刊: Applied Physics Letters  (AIP Available online 1995)
卷期: Volume 66, issue 10  

页码: 1228-1230

 

ISSN:0003-6951

 

年代: 1995

 

DOI:10.1063/1.113245

 

出版商: AIP

 

数据来源: AIP

 

摘要:

An in‐plane gate field‐effect transistor is characterized by ultrafast electro‐optic sampling. The transistor is monolithically integrated with photoconductive switches in coplanar waveguide and <0.5 ps measurement time resolution is achieved. The gate‐drain capacitance of the transistor is obtained as 1.8 fF at zero drain voltage from displacement current transients. The gate‐drain capacitance is dominated by parasitic capacitance and the intrinsic gate‐drain capacitance is estimated as less than 0.2 fF. ©1995 American Institute of Physics.

 

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