Oxide‐nitride‐oxide/Si(111) interfaces analyzed by optical second harmonic generation
作者:
Kohji Watanabe,
Hiroyuki Hirayama,
Masato Kawata,
期刊:
Applied Physics Letters
(AIP Available online 1995)
卷期:
Volume 66,
issue 17
页码: 2232-2234
ISSN:0003-6951
年代: 1995
DOI:10.1063/1.113176
出版商: AIP
数据来源: AIP
摘要:
Optical second harmonic generation has been used to study oxide‐nitride‐oxide/Si(111) interfaces. The second harmonic (SH) intensity is measured as a function of an azimuthal rotation angle at a 45° incidence angle. The SH intensities change for wet oxidation, nitridation and reoxidation. The SH intensity from wet oxide/Si(111) interface decreases as the temperature during wet oxidation increases. With subsequent nitridation, this SH intensity of the oxidized interface then decreases. However, the SH intensity increases again with reoxidation. ©1995 American Institute of Physics.
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