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Oxide‐nitride‐oxide/Si(111) interfaces analyzed by optical second harmonic generation

 

作者: Kohji Watanabe,   Hiroyuki Hirayama,   Masato Kawata,  

 

期刊: Applied Physics Letters  (AIP Available online 1995)
卷期: Volume 66, issue 17  

页码: 2232-2234

 

ISSN:0003-6951

 

年代: 1995

 

DOI:10.1063/1.113176

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Optical second harmonic generation has been used to study oxide‐nitride‐oxide/Si(111) interfaces. The second harmonic (SH) intensity is measured as a function of an azimuthal rotation angle at a 45° incidence angle. The SH intensities change for wet oxidation, nitridation and reoxidation. The SH intensity from wet oxide/Si(111) interface decreases as the temperature during wet oxidation increases. With subsequent nitridation, this SH intensity of the oxidized interface then decreases. However, the SH intensity increases again with reoxidation. ©1995 American Institute of Physics.

 

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