EBS‐5 is a vector scan electron beam lithography system for research and development which evolved from the EBS‐4 system developed by Hughes Research Laboratories in 1977–1980. The EBS‐5 system features higher throughput, improved diagnostics, and more user friendly software. The computer architecture of EBS‐5 consists of a Micro VAX computer and a distributed microprocessor control system, which achieves continuous writing speeds of 13 MHz. A deflection amplifier has been developed which achieves a rise time of 80 ns. The ratio of noise and drift currents to the signal current is lower than 1×10−5in both the deflection amplifier and the lens supplies to ensure the reproducible exposure of submicron patterns. Extensive software was developed to support the layout and fracturing of pattern data.