Atomically resolved images of bismuth films on mica with an atomic force microscope
作者:
A. L. Weisenhorn,
P. N. Henriksen,
H. T. Chu,
R. D. Ramsier,
D. H. Reneker,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
(AIP Available online 1991)
卷期:
Volume 9,
issue 2
页码: 1333-1335
ISSN:1071-1023
年代: 1991
DOI:10.1116/1.585190
出版商: American Vacuum Society
关键词: ATOMIC FORCE MICROSCOPY;FILM GROWTH;BISMUTH;THIN FILMS;CRYSTAL STRUCTURE;OXIDATION;EPITAXY;ADSORPTION
数据来源: AIP
摘要:
Bi(111) films grown on mica substrates and then exposed to air have been imaged with an atomic force miroscope in 0.01 M HCl. By exposing the Bi(111) to air, layers of Bi oxide are readily formed, which can be removed by imaging in HCl. The images are atomically resolved and show two types of structure: large epitaxial areas of hexagonal structure with a spacing of 7.6 Å, and a few smaller regions with a spacing of 4.5 Å. The former agrees well with the (√3×√3)R30° structure of an overlayer of atomic oxygen atoms adsorbed on Bi(111), and the latter with the uncovered Bi(111) surface.
点击下载:
PDF
(303KB)
返 回