A field‐assisted emission model of interface states in heterostructure devices
作者:
S. Mohajerzadeh,
C. R. Selvakumar,
J. P. Noel,
D. C. Houghton,
期刊:
Journal of Applied Physics
(AIP Available online 1995)
卷期:
Volume 78,
issue 12
页码: 7382-7386
ISSN:0021-8979
年代: 1995
DOI:10.1063/1.360725
出版商: AIP
数据来源: AIP
摘要:
We present a physical model to study the interface states in p‐n heterostructures at different ambient temperatures. Field‐assisted emission of such states is considered as the source for the linear increase in charge concentration at the p‐n interface with the applied reverse voltage. The high frequency capacitance‐voltage technique is used to study the charging and discharging of interface states in an MBE‐made sample at different temperatures and different biases. The experimental results show good agreement with the prediction of our model. ©1995 American Institute of Physics.
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