Model of collisional sheath evolution in plasma source ion implantation
作者:
Dezhen Wang,
Tengcai Ma,
Xinlu Deng,
期刊:
Journal of Applied Physics
(AIP Available online 1993)
卷期:
Volume 74,
issue 4
页码: 2986-2988
ISSN:0021-8979
年代: 1993
DOI:10.1063/1.354612
出版商: AIP
数据来源: AIP
摘要:
A model is developed to study the temporal evolution of the sheath during a pulse of high negative voltage applied to a target immersed in a plasma, such as that present in plasma source ion implantation. This model covers the whole range from collision free to collision dominated sheaths. The sheath expansion velocity and the position of the sheath edge as a function of time in planar geometries for various pressures are obtained.
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