Chemical interactions at Ta/fluorinated polymer buried interfaces
作者:
G.-R. Yang,
Y.-P. Zhao,
B. Wang,
E. Barnat,
J. McDonald,
T.-M. Lu,
期刊:
Applied Physics Letters
(AIP Available online 1998)
卷期:
Volume 72,
issue 15
页码: 1846-1847
ISSN:0003-6951
年代: 1998
DOI:10.1063/1.121202
出版商: AIP
数据来源: AIP
摘要:
In this letter, we study Ta/parylene-F (PA–F) buried interfaces using x-ray photoelectron spectroscopy. We found that the Ta–F bond was formed at the Ta/PA–F interface after depositing a layer of thin Ta film(<50 Å).For theAr+orO2plasma pretreated PA–F surface, in addition to the Ta–F bond, a Ta–C bond was observed at the buried interface after Ta metallization. The Ta–C bond may be responsible for the enhancement of Ta/PA–F adhesion. ©1998 American Institute of Physics.
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