首页   按字顺浏览 期刊浏览 卷期浏览 Submicrometer‐resolution etching of integrated circuit materials with laser&hyph...
Submicrometer‐resolution etching of integrated circuit materials with laser‐generated atomic fluorine

 

作者: G. L. Loper,   M. D. Tabat,  

 

期刊: Journal of Applied Physics  （AIP Available online 1985）
卷期: Volume 58, issue 9  

页码: 3649-3651

 

ISSN:0021-8979

 

年代: 1985

 

DOI:10.1063/1.335748

 

出版商: AIP

 

数据来源: AIP

 

摘要:

We have demonstrated submicrometer‐resolution lithography by ultraviolet laser‐induced radical etching. We previously showed that this method can provide highly specific and efficient etching of various refractory metal/insulator and semiconductor/insulator substrate combinations.

 

点击下载:  PDF (257KB)



返 回