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Sputter deposition of Y‐Ba‐Cu‐O compound system

 

作者: D. Burbidge,   P. Mulhern,   S. Dew,   R. Parsons,  

 

期刊: AIP Conference Proceedings  （AIP Available online 1988）
卷期: Volume 165, issue 1  

页码: 87-94

 

ISSN:0094-243X

 

年代: 1988

 

DOI:10.1063/1.37085

 

出版商: AIP

 

数据来源: AIP

 

摘要:

DC planar magnetron sputtering from a composite target has been used to produce films of YBa2Cu3O7−xwith zero resistance at 77K. Various aspects of the deposition process are addressed with a view to scaling up the process for production purposes.

 

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