Protection of an interrupted molecular‐beam epitaxially grown surface by a thin epitaxial layer of InAs
作者:
Yu‐Jeng Chang,
Herbert Kroemer,
期刊:
Applied Physics Letters
(AIP Available online 1984)
卷期:
Volume 45,
issue 4
页码: 449-451
ISSN:0003-6951
年代: 1984
DOI:10.1063/1.95211
出版商: AIP
数据来源: AIP
摘要:
When the molecular‐beam epitaxial (MBE) growth of GaAs or (Al,Ga)As is interrupted and the surface is exposed to air for other kinds of processing, a high concentration (>2×1011cm−2) of surface defects tends to form which will show up as highly detrimental interface defects if the MBE growth is subsequently resumed. We show that the surface can be protected by a thin epitaxial layer of InAs, which is highly resistant to many kinds of processing steps, and which can be thermally removed before resumption of growth, leading to an ‘‘invisible’’ restart interface.
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