首页   按字顺浏览 期刊浏览 卷期浏览 Fabrication and characterization of silicon field emission diodes and triodes
Fabrication and characterization of silicon field emission diodes and triodes

 

作者: Q. Li,   M. Y. Yuan,   W. P. Kang,   S. H. Tang,   J. F. Xu,   D. Zhang,   J. L. Wu,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena  (AIP Available online 1994)
卷期: Volume 12, issue 2  

页码: 676-679

 

ISSN:1071-1023

 

年代: 1994

 

DOI:10.1116/1.587368

 

出版商: American Vacuum Society

 

关键词: SILICON DIODES;FIELD EMISSION;OXIDATION;FABRICATION;IV CHARACTERISTIC;LITHOGRAPHY;ARRAYS;MICROELECTRONICS;Si

 

数据来源: AIP

 

摘要:

I–Vcharacteristics of silicon field emission diode and triode were investigated. The maximum emission current of 17 μA and the lowest onset voltage of 60 V were obtained by an array of 245 silicon tips. The typical reverse recovery time of the diode was 350 ps. The typical transconductance of the triode was about 10−7S. The fabrication processes for forming sharp silicon conical tips with a gate hole diameter 1 μm smaller than the corresponding oxide mask is described. The results of a high temperature activation process for improving emission characteristics of the device are presented. The stability and uniformity of the devices affected by the fabrication process and emission environment are also discussed in this paper.

 

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