Formation of (100)GaAs on (100) silicon by laser recrystallization
作者:
A. Christou,
T. Efthimiopoulos,
G. Kiriakidis,
C. Varmazis,
期刊:
Applied Physics Letters
(AIP Available online 1986)
卷期:
Volume 48,
issue 22
页码: 1516-1518
ISSN:0003-6951
年代: 1986
DOI:10.1063/1.96853
出版商: AIP
数据来源: AIP
摘要:
Epitaxial growth of (100) GaAs on (100) silicon was achieved by excimer laser annealing of amorphous GaAs layers at 248 nm. An AlAs encapsulation layer was found to be necessary to prevent the loss of arsenic during laser annealing. An energy density of 105 mJ/cm2was the critical energy density for recrystallization. Field‐effect transistors were fabricated on the regrown (100) GaAs and resulted in a transconductance of 70–80 ms/mm.
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