Pulsed ruby and CW, Nd-YAG laser annealing of Bi implanted Si single crystals investigated by channeling
作者:
B.I. Deutch,
Chu Te Chang,
Cao De-Xin,
Leou Shang-Hwai,
Zhow Zu-Yao,
Hu Jia-Zeng,
Dai Ren-Zhi,
Tsou Shih-Chang,
期刊:
Radiation Effects
(Taylor Available online 1980)
卷期:
Volume 51,
issue 3-4
页码: 179-184
ISSN:0033-7579
年代: 1980
DOI:10.1080/00337578008209998
出版商: Taylor & Francis Group
数据来源: Taylor
摘要:
The channeling Rutherford back scattering technique (RBS) has been used to investigate pulsedQ-switched ruby laser and CW Nd-YAG laser annealing of ⟨111⟩ Si single crystals implanted with 40-keV Bi to a dose of 1 × 1014/cm2. The pulsed laser annealing completely removed implantation induced lattice damage and left high impurity substitutionality. However, redistribution of Bi atoms occurred in the annealing process; the percentage of impurities, which segregated at the surface reached 30% and 60% for a single pulse and overlapped pulse, respectively. This implies that a surface melting process occurred. The same sample was also annealed by a CW Nd-YAG laser. Backscattering spectra indicated that recrystallization occurred by means of a thermal solid-phase epitaxial regrowth process, which under appropriate conditions optimized almost completely the recovery of the lattice damage, leaving the Bi atoms mainly in substitutional sites (∼90%) without impurity redistribution.
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