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Hydrogen passivation of a bulk donor defect (Ec−0.36 eV) in GaAs

 

作者: S. J. Pearton,  

 

期刊: Journal of Applied Physics  (AIP Available online 1982)
卷期: Volume 53, issue 6  

页码: 4509-4511

 

ISSN:0021-8979

 

年代: 1982

 

DOI:10.1063/1.331190

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The passivation of a bulk donor defect (Ec–0.36 eV) in polycrystalline GaAs by reaction with atomic hydrogen has been observed using deep level transient spectroscopy. The concentration profile of the defect is presented as a function of the duration and temperature of the exposure to atomic hydrogen—when exposed for 3 h at 250 °C, 3×1015donor defects cm−3were passivated to a depth of ∼1.1 &mgr;m.

 

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