Microprobe of helium ions
作者:
T. Itakura,
K. Horiuchi,
N. Nakayama,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
(AIP Available online 1991)
卷期:
Volume 9,
issue 5
页码: 2596-2601
ISSN:1071-1023
年代: 1991
DOI:10.1116/1.585699
出版商: American Vacuum Society
关键词: HELIUM IONS;ION SOURCES;FOCUSING;ION MICROPROBE ANALYSIS;ION PROBES;HOPPING;IV CHARACTERISTIC;DESIGN;FIELD EMISSION
数据来源: AIP
摘要:
A helium field ion source emits intense beams from a (111) plane protruding from a tungsten emitter. Gomer’s hopping model was expanded to explain theI–Vcharacteristic of the plane. Our calculations agreed with the experimental results. To make a microprobe of helium ions, we constructed a 100 keV focusing column. It has a gimbal assembly and a phosphor screen with a microchannel plate to adjust the beam axis. Using a measured energy spread of 1 eV, the probe diameter was calculated to be less than 10 nm at a 1 pA probe current. Using scanning ion microscope images obtained with 90 keV helium ions, the actual probe diameter was estimated to be 2 μm. Although some improvements are necessary to focus the beam sharply, we showed the basic design of the focusing column for a helium field ion source.
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