Conditions for uniform growth of GaAs1−xPxsuperlattices
作者:
A. E. Blakeslee,
A. Kibbler,
M. W. Wanlass,
R. M. Biefeld,
期刊:
Journal of Applied Physics
(AIP Available online 1986)
卷期:
Volume 60,
issue 3
页码: 1206-1208
ISSN:0021-8979
年代: 1986
DOI:10.1063/1.337365
出版商: AIP
数据来源: AIP
摘要:
Nonplanar morphology and compositional inhomogeneity are observed in GaAs1−xPxsuperlattices when the phosphorus content is substantially different in adjacent sublayers. The main characteristic feature of the distortion is a series of ribbonlike regions running through the superlattice which etch at a faster rate and contain more phosphorus than the surrounding material and are also the source of clusters of dislocations. Morphological stability and a general decrease in dislocation density can be effected by decreasing the interlayer strain, i.e., compositional difference, between the superlattice sublayers.
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