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Conditions for uniform growth of GaAs1−xPxsuperlattices

 

作者: A. E. Blakeslee,   A. Kibbler,   M. W. Wanlass,   R. M. Biefeld,  

 

期刊: Journal of Applied Physics  (AIP Available online 1986)
卷期: Volume 60, issue 3  

页码: 1206-1208

 

ISSN:0021-8979

 

年代: 1986

 

DOI:10.1063/1.337365

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Nonplanar morphology and compositional inhomogeneity are observed in GaAs1−xPxsuperlattices when the phosphorus content is substantially different in adjacent sublayers. The main characteristic feature of the distortion is a series of ribbonlike regions running through the superlattice which etch at a faster rate and contain more phosphorus than the surrounding material and are also the source of clusters of dislocations. Morphological stability and a general decrease in dislocation density can be effected by decreasing the interlayer strain, i.e., compositional difference, between the superlattice sublayers.

 

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