Picosecond responses of low-dosage arsenic-ion-implanted GaAs photoconductors
作者:
Gong-Ru Lin,
Ci-Ling Pan,
期刊:
Applied Physics Letters
(AIP Available online 1997)
卷期:
Volume 71,
issue 20
页码: 2901-2903
ISSN:0003-6951
年代: 1997
DOI:10.1063/1.120210
出版商: AIP
数据来源: AIP
摘要:
Ultrafast optoelectronic characteristics of GaAs implanted with 200 keV arsenic ions at dosage as low as1013 ions/cm2are reported. Ultrashort photoexcited carrier lifetimes of0.23±0.02,0.87±0.02,and3±0.2 pswere determined for as-implanted, rapid thermal annealing (RTA) (600 °C for 30 s) and furnace-annealed (600 °C for 30 min) arsenic-ion-implanted GaAs orGaAs:As+,respectively. The switching response of photoconductive switches (PCSs) fabricated on the latter two materials were∼3and 8 ps, respectively. The leakage current of the PCS fabricated on furnace-annealed sample was as low as 30 nA. The breakdown fields exceeded 150 (instrument-limited) and 90 kV/cm for furnace- and RTA-annealed samples, respectively. The optical responsivity of low-dosage arsenic-implanted GaAs photoconductive switch can be as high as 0.01 A/W. This also compared favorably with the same device made on state-of-the-art photoconductor such as molecular-beam epitaxy grown GaAs at low temperatures. ©1997 American Institute of Physics.
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