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Growth and strain symmetrization of Si/Ge/C/Sn quaternary alloys by molecular beam epitaxy

 

作者: F. J. Guarin,   S. S. Iyer,   A. R. Powell,   B. A. Ek,  

 

期刊: Applied Physics Letters  (AIP Available online 1996)
卷期: Volume 68, issue 25  

页码: 3608-3610

 

ISSN:0003-6951

 

年代: 1996

 

DOI:10.1063/1.115745

 

出版商: AIP

 

数据来源: AIP

 

摘要:

We have synthesized, via molecular beam epitaxy alloys of SixSnyC1−x−ywith symmetric strain. In this work we report the growth of systems with varying compositions/band gaps including the first silicon‐based quaternary (Si/Ge/Sn/C) system, which offers an additional degree of freedom for strain and band gap engineering in Si‐based alloys. We report the growth of Si.955Sn.03C.015alloys up to 4500 A˚ in thickness and quaternaries of composition in the neighborhood of Si.835Ge.125Sn.03C.01. Infrared absorption spectroscopy and photoluminescence data have provided evidence of the potential for significant band gap modification in these alloys. ©1996 American Institute of Physics.

 

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