Growth and strain symmetrization of Si/Ge/C/Sn quaternary alloys by molecular beam epitaxy
作者:
F. J. Guarin,
S. S. Iyer,
A. R. Powell,
B. A. Ek,
期刊:
Applied Physics Letters
(AIP Available online 1996)
卷期:
Volume 68,
issue 25
页码: 3608-3610
ISSN:0003-6951
年代: 1996
DOI:10.1063/1.115745
出版商: AIP
数据来源: AIP
摘要:
We have synthesized, via molecular beam epitaxy alloys of SixSnyC1−x−ywith symmetric strain. In this work we report the growth of systems with varying compositions/band gaps including the first silicon‐based quaternary (Si/Ge/Sn/C) system, which offers an additional degree of freedom for strain and band gap engineering in Si‐based alloys. We report the growth of Si.955Sn.03C.015alloys up to 4500 A˚ in thickness and quaternaries of composition in the neighborhood of Si.835Ge.125Sn.03C.01. Infrared absorption spectroscopy and photoluminescence data have provided evidence of the potential for significant band gap modification in these alloys. ©1996 American Institute of Physics.
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