Oxidation sharpening of silicon tips
作者:
T. S. Ravi,
R. B. Marcus,
D. Liu,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
(AIP Available online 1991)
卷期:
Volume 9,
issue 6
页码: 2733-2737
ISSN:1071-1023
年代: 1991
DOI:10.1116/1.585680
出版商: American Vacuum Society
关键词: SILICON;ETCHING;OXIDATION;SENSORS;FIELD EMISSION;MICROELECTRONICS;ELECTRODES;Si
数据来源: AIP
摘要:
Sharp microtips of silicon have potential applications as field emitters and as electrical or mechanical microsensors. This study describes a single unified etching/oxidation treatment that results in uniform tips with controlled radii of atomic dimensions or larger. Variations in the etching/oxidation treatment form multiple tips with two or four tips per etched pyramid, which offer the possibility of higher emission current density for field emitter applications, and higher sensitivity for microsensor applications.
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