Evidence for hole traps at the amorphous silicon/amorphous silicon–germanium heterostructure interface
作者:
C. Palsule,
U. Paschen,
J. D. Cohen,
J. Yang,
S. Guha,
期刊:
Applied Physics Letters
(AIP Available online 1997)
卷期:
Volume 70,
issue 4
页码: 499-501
ISSN:0003-6951
年代: 1997
DOI:10.1063/1.118192
出版商: AIP
数据来源: AIP
摘要:
Voltage-pulse stimulated capacitance transient measurements on a seriesa-Si:H/a-Si, Ge:H devices disclose a large density of hole traps at or very close to the heterojunction interface. The transient signal magnitude is independent of temperature or applied bias, ruling out charge polarization effects or a defect creation process caused by the filling pulse. While the areal density of such hole traps is considerable (within a factor of 2 of1011 cm−2for all samples) these traps do not appear to behave as recombination centers. Also, the treatment of thea-Si:H/a-Si,Ge:H interface during growth can significantly alter the concentration of these traps. ©1997 American Institute of Physics.
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