Interactions of low-energy (20–800 eV) nitrogen ions with Cu(100): A combined temperature programmed desorption and electron energy loss spectroscopy study of chemisorption and entrapment states
作者:
H. Yu,
K. T. Leung,
期刊:
Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films
(AIP Available online 1998)
卷期:
Volume 16,
issue 1
页码: 30-34
ISSN:0734-2101
年代: 1998
DOI:10.1116/1.580988
出版商: American Vacuum Society
数据来源: AIP
摘要:
The interactions of low-energy (20–800 eV) nitrogen ions with Cu(100) at room temperature have been investigated by using temperature programmed desorption (TPD) mass spectrometry and high-resolution electron energy loss spectroscopy. The desorption feature observed at 760 K can be attributed to adsorption of surface atomic nitrogen on fourfold-hollow sites. When the impact energy (IE) of the nitrogen ions used for the irradiation exceeded 75 eV, our TPD results further revealed a new desorption feature at 520 K, which can be tentatively assigned to ion-implanted atomic and/or molecular nitrogen. The intensities and temperatures of the desorption maxima of the surface (chemisorption) and ion-implantation (entrapment) features were found to greatly depend on the IE and the dosage of the ions. Other effects including the creation of defect sites as a result of the ion irradiation are also investigated.
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