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Low‐energy ion‐induced electron emission from gas‐covered surfaces

 

作者: P. C. Smith,   B. Hu,   D. N. Ruzic,  

 

期刊: Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films  (AIP Available online 1994)
卷期: Volume 12, issue 5  

页码: 2692-2700

 

ISSN:0734-2101

 

年代: 1994

 

DOI:10.1116/1.579090

 

出版商: American Vacuum Society

 

关键词: ION COLLISIONS;HELIUM IONS;ARGON IONS;EV RANGE 100−1000;ELECTRON EMISSION;TUNGSTEN;TUNGSTEN BASE ALLOYS;ALUMINIUM BASE ALLOYS;TITANIUM ALLOYS;COPPER ALLOYS;SILICON;BERYLLIUM;ALUMINIUM;OXIDATION;GRAIN SIZE;SILICON ALLOYS;W;(W,Ti);Al;(Al,Cu);(Al,Si);Si;Be

 

数据来源: AIP

 

摘要:

Measurements of ion‐induced electron emission have been performed with helium and argon ions with energies between 300 and 900 eV on W, W with 10% Ti, Al, Al with 1% Cu, Al with 1% Si, Si, and Be. This article describes many of the important surface characteristics that influence the ion‐induced electron emission. For low‐energy ions, the substrate material was found to be less important as the velocity of the incident ion decreased. In the case of incident Ar+the substrate material had a negligible effect on the emission for this energy range. The presence of an adsorbed layer enhanced emission in all cases. Heating the substrates resulted in oxidation of the surfaces and a subsequent increase in emission. The electron emission from aluminum samples with smaller grain sizes was higher than samples of identical composition with larger grains. This effect is due to the greater number of adsorption sites resulting from the higher grain boundary area.

 

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