Some useful yield estimates for ion beam sputtering and ion plating at low bombarding energies

 

作者: P. C. Zalm,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena  （AIP Available online 1984）
卷期: Volume 2, issue 2  

页码: 151-152

 

ISSN:0734-211X

 

年代: 1984

 

DOI:10.1116/1.582936

 

出版商: American Vacuum Society

 

关键词: ion beams;sputtering;ion plating;sims;auger electron spectroscopy;threshold energy;yields

 

数据来源: AIP

 

 

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