The activation energy for GaAs/AlGaAs interdiffusion
作者:
S. F. Wee,
M. K. Chai,
K. P. Homewood,
W. P. Gillin,
期刊:
Journal of Applied Physics
(AIP Available online 1997)
卷期:
Volume 82,
issue 10
页码: 4842-4846
ISSN:0021-8979
年代: 1997
DOI:10.1063/1.366345
出版商: AIP
数据来源: AIP
摘要:
We present data of the interdiffusion coefficient of AlGaAs/GaAs over the temperature range 750–1150 °C, and obtainEAandD0values of3.6±0.2 eVand 0.2 (with an uncertainty from 0.04 to 1.1)cm2/s,respectively. These data are compared with those from the literature taken under a wide range of experimental conditions. We show that despite the range of activation energies quoted in the literature all the data can be described using a single activation energy. Using this value ofEAto fit the published data and then determiningD0for each data point we find that the published data fall into two clusters. One, for samples annealed under a gallium rich overpressure and a second for As rich or capped anneals. This result can be explained by the diffusion in all cases being governed by a single mechanism, vacancy-controlled second-nearest-neighbor hopping. ©1997 American Institute of Physics.
点击下载:
PDF
(104KB)
返 回