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Al2O3as an antireflection coating for InP/InGaAsP LEDs

 

作者: A. K. Chin,   G. Zydzik,   S. Singh,   L. G. Van Uitert,   G. Minneci,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena  (AIP Available online 1983)
卷期: Volume 1, issue 1  

页码: 72-73

 

ISSN:0734-211X

 

年代: 1983

 

DOI:10.1116/1.582507

 

出版商: American Vacuum Society

 

关键词: indium phosphides;gallium arsenides;light emitting diodes;aluminium oxides;antireflection coatings;electron beam evaporation

 

数据来源: AIP

 

摘要:

Front‐emitting InP/InGaAsP LEDs are presently used for optical communications. They operate at 1.3 μm, the wavelength at which dispersion is minimum for silica fibers. In this paper, we discuss the use of an electron‐beam‐deposited Al2O3antireflection coating to increase the coupled power from a 1.3‐μm InP/InGaAsP LED and thereby increase the transmission distance as well. Al2O3is chosen since its index of refraction (n∼1.77) is very close to the optimum value ofn=1.79 for a single layer AR coating on InP at λ=1.3 μm. Additionally, the Al2O3coefficient of thermal expansion (α∼5.6×10−6/K) nearly matches that of InP (α∼4.5×10−6/K). A factor of 1.31 ± 0.08 increase in power, butt‐coupled into an FT3 fiber, was obtained after coating 1.3‐μm InP/InGaAsP LEDs with a 1850‐Å‐thick Al2O3film. Furthermore, the Al2O3coating process is simple and produces AR coatings which compare favorably with optimum hydrogen containing silicon nitride films.

 

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