Microscopic mobility in hydrogenated amorphous silicon
作者:
J. Kakalios,
期刊:
Philosophical Magazine Letters
(Taylor Available online 1987)
卷期:
Volume 55,
issue 3
页码: 129-134
ISSN:0950-0839
年代: 1987
DOI:10.1080/09500838708228744
出版商: Taylor & Francis Group
数据来源: Taylor
摘要:
It has recently been proposed that the electron microscopic mobility in hydrogenated amorphous silicon is of the order of 100cm2V−1s−1, and that the observed lower mobility values result from scattering by potential fluctuations arising from defect centres which have a negative effective correlation energy. We show that such potential fluctuations cannot lower the mobility to its observed value of 10cm2V−1s−1. Moreover, we find that the experimental evidence used to support the claim of a higher mobility can be adequately explained by the lower of the accepted values.
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