Control of plasma parameters and electric fields in a microwave‐rf hybrid plasma
作者:
Hiroharu Fujita,
Yoshihiro Okuno,
Yasunori Ohtsu,
Shinya Yagura,
期刊:
Journal of Applied Physics
(AIP Available online 1990)
卷期:
Volume 67,
issue 10
页码: 6114-6117
ISSN:0021-8979
年代: 1990
DOI:10.1063/1.345172
出版商: AIP
数据来源: AIP
摘要:
Control of electron energy and electric field in a low‐pressure argon plasma produced by a hybrid (2.45 GHz microwave and 13.56 MHz rf) discharge was studied for thin‐film preparation. The hybrid plasma was found to be useful over a wide range of magnetic field strengths, unlike conventional microwave plasma. A novel probe measurement revealed that the electron temperature and density were effectively controllable by the microwave power and the magnetic field strength, rather than the rf power, and the potential profile describing the electric field was controllable by the magnetic field strength. The control of an ion beam injected from the microwave into the rf plasma is described.
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