Investigation of the Sputtering of Aluminum Using Atomic‐Absorption Spectroscopy
作者:
A. J. Stirling,
W. D. Westwood,
期刊:
Journal of Applied Physics
(AIP Available online 1970)
卷期:
Volume 41,
issue 2
页码: 742-748
ISSN:0021-8979
年代: 1970
DOI:10.1063/1.1658742
出版商: AIP
数据来源: AIP
摘要:
The techniques of atomic‐absorption and emission spectroscopy have been used to detect atoms ejected from an aluminum cathode which is sputtered in a glow discharge in argon. The rate of deposition of the sputtered material is measured using a piezoelectric microbalance which is capable of measuring deposition rates as small as 9.2×10−8G min−1. The use of atomic‐absorption spectroscopy is shown to be a sensitive and reliable method for the study of the sputtering process. Experimental results indicate that some of the sputtered material in the glow discharge exists in the form of ``molecules.'' However, the absolute numbers of sputtered atoms has not been determined due to uncertainties in the tabulated values of atomic‐transition probabilities.
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