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Absorption processes in the XeCl laser

 

作者: L. F. Champagne,   L. J. Palumbo,   T. G. Finn,  

 

期刊: Applied Physics Letters  (AIP Available online 1979)
卷期: Volume 34, issue 5  

页码: 315-318

 

ISSN:0003-6951

 

年代: 1979

 

DOI:10.1063/1.90788

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Transient absorption in Ne/Xe/HCl mixtures and various rare gas combinations are measured. The observed results are matched with a numerical model to determine the dominant absorbing species in the XeCl laser. In pure neon plasmas Ne*2is a dominant absorber. Addition of xenon greatly reduces this absorption through the mechanism of Penning ionization. Absorption is not changed by adding HCl to the optimum neon‐xenon concentration.

 

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