Absorption processes in the XeCl laser
作者:
L. F. Champagne,
L. J. Palumbo,
T. G. Finn,
期刊:
Applied Physics Letters
(AIP Available online 1979)
卷期:
Volume 34,
issue 5
页码: 315-318
ISSN:0003-6951
年代: 1979
DOI:10.1063/1.90788
出版商: AIP
数据来源: AIP
摘要:
Transient absorption in Ne/Xe/HCl mixtures and various rare gas combinations are measured. The observed results are matched with a numerical model to determine the dominant absorbing species in the XeCl laser. In pure neon plasmas Ne*2is a dominant absorber. Addition of xenon greatly reduces this absorption through the mechanism of Penning ionization. Absorption is not changed by adding HCl to the optimum neon‐xenon concentration.
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