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Electronic structure of small coverages of column III metals on silicon [100]

 

作者: John E. Klepeis,   Walter A. Harrison,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena  (AIP Available online 1988)
卷期: Volume 6, issue 4  

页码: 1315-1319

 

ISSN:0734-211X

 

年代: 1988

 

DOI:10.1116/1.584256

 

出版商: American Vacuum Society

 

关键词: SILICON;ALUMINIUM;INTERFACE STATES;ADSORPTION;IMPURITY STATES;ENERGY GAP;FERMI LEVEL;Si

 

数据来源: AIP

 

摘要:

We calculate the electronic structure of geometrically ideal interfaces between column III metals and silicon. For a single neutral adatom the associated metallic Fermi energy must lie between the energy (0,+), for the removal of an electron, and the energy (0,−), for adding an electron, but is otherwise unrestricted. This circumstance also holds for many uncoupled adatoms and will produce pinning if the (0,+) and (0,−) levels are in the gap and the semiconductor Fermi energy is outside this range. At still larger coverages the occupied (0,+) levels and the (0,−) levels shift and broaden in energy until the gap between them disappears, pinningn‐type andp‐type semiconductors at the same energy. We find that the (0,+) level for a single aluminum adatom is in the silicon gap and that the (0,−) level is in the conduction band. In addition, the (0,+) level moves towards the valence band maximum as the metal coverage is increased.

 

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