Electronic structure of small coverages of column III metals on silicon [100]
作者:
John E. Klepeis,
Walter A. Harrison,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena
(AIP Available online 1988)
卷期:
Volume 6,
issue 4
页码: 1315-1319
ISSN:0734-211X
年代: 1988
DOI:10.1116/1.584256
出版商: American Vacuum Society
关键词: SILICON;ALUMINIUM;INTERFACE STATES;ADSORPTION;IMPURITY STATES;ENERGY GAP;FERMI LEVEL;Si
数据来源: AIP
摘要:
We calculate the electronic structure of geometrically ideal interfaces between column III metals and silicon. For a single neutral adatom the associated metallic Fermi energy must lie between the energy (0,+), for the removal of an electron, and the energy (0,−), for adding an electron, but is otherwise unrestricted. This circumstance also holds for many uncoupled adatoms and will produce pinning if the (0,+) and (0,−) levels are in the gap and the semiconductor Fermi energy is outside this range. At still larger coverages the occupied (0,+) levels and the (0,−) levels shift and broaden in energy until the gap between them disappears, pinningn‐type andp‐type semiconductors at the same energy. We find that the (0,+) level for a single aluminum adatom is in the silicon gap and that the (0,−) level is in the conduction band. In addition, the (0,+) level moves towards the valence band maximum as the metal coverage is increased.
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