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InP metal‐insulated‐semiconductor Schottky contacts using surface oxide layers prepared with bromine water

 

作者: K. Kamimura,   T. Suzuki,   A. Kunioka,  

 

期刊: Journal of Applied Physics  (AIP Available online 1980)
卷期: Volume 51, issue 9  

页码: 4905-4907

 

ISSN:0021-8979

 

年代: 1980

 

DOI:10.1063/1.328362

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Oxide layers prepared with bromine water are found to increase the barrier height for Au‐InP Schottky diodes. Electrical characteristics are measured and the relationships between the preparation conditions and the diode parameters are examined. The typical value of the barrier height and the ideality factor are 0.83 eV and 1.1, respectively. Some instabilities are observed in the diode characteristics.

 

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