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Computer simulation model of the effects of interface states on high‐performance amorphous silicon solar cells

 

作者: H. Tasaki,   W. Y. Kim,   M. Hallerdt,   M. Konagai,   K. Takahashi,  

 

期刊: Journal of Applied Physics  (AIP Available online 1988)
卷期: Volume 63, issue 2  

页码: 550-560

 

ISSN:0021-8979

 

年代: 1988

 

DOI:10.1063/1.340085

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A computer simulation model of amorphous silicon solar cells using a Scharfetter and Gummel solution of Poisson’s equation and Taylor and Simmons occupancy statistics for the dangling bond gap states (Dstates), has been developed. With a suitable choice of parameters, the numerical results for solar cell collection efficiency and dark and illuminatedI‐Vcharacteristics agree well with experimental values. The model has been used specifically to study the influence of interface states at the TCO‐p(transparent conductive oxide),p‐i,i‐n, andn‐metal interfaces and to explain the beneficial role of a graded‐band‐gap layer at thep‐iinterface.

 

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