Low temperature plasma enhanced chemical vapor deposition of fluorinated silicon oxide films as an interlayer dielectric

 

作者: Juho Song,   P. K. Ajmera,   G. S. Lee,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena  （AIP Available online 1997）
卷期: Volume 15, issue 5  

页码: 1843-1846

 

ISSN:1071-1023

 

年代: 1997

 

DOI:10.1116/1.589337

 

出版商: American Vacuum Society

 

关键词: SiO2

 

数据来源: AIP

 

 

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