Picosecond carrier lifetime in GaAs implanted with high doses of As ions: An alternative material to low‐temperature GaAs for optoelectronic applications
作者:
A. Krotkus,
S. Marcinkevicius,
J. Jasinski,
M. Kaminska,
H. H. Tan,
C. Jagadish,
期刊:
Applied Physics Letters
(AIP Available online 1995)
卷期:
Volume 66,
issue 24
页码: 3304-3306
ISSN:0003-6951
年代: 1995
DOI:10.1063/1.113738
出版商: AIP
数据来源: AIP
摘要:
Nonstoichiometric GaAs obtained by implantation with 2 MeV arsenic ions at 1015cm−2dose is studied. As‐implanted samples show a <200 fs lifetime of photocarriers and low resistivity due to hopping, with mobility less than 1 cm2/V s. Annealing of the samples at 600 °C leads to substantial recovery of postimplant damage, as seen from Rutherford backscattering channeling spectra and mobility increase to about 2000 cm2/V s, but photocarrier lifetime is still about 1 ps. These parameters are similar to those of low‐temperature GaAs annealed at 600 °C, and make arsenic implanted GaAs an interesting material for optoelectronic applications. ©1995 American Institute of Physics.
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