Thermal conduction normal to diamond‐silicon boundaries
作者:
K. E. Goodson,
O. W. Ka¨ding,
M. Ro¨sner,
R. Zachai,
期刊:
Applied Physics Letters
(AIP Available online 1995)
卷期:
Volume 66,
issue 23
页码: 3134-3136
ISSN:0003-6951
年代: 1995
DOI:10.1063/1.113625
出版商: AIP
数据来源: AIP
摘要:
Passive diamond layers fabricated using chemical vapor deposition can improve thermal conduction in electronic microstructures. The benefit of using diamond depends strongly on the thermal boundary resistance between active semiconducting regions, where heat is generated, and the diamond. Two independent experimental methods measure the total thermal resistance for conduction normal to 0.2, 0.5, and 2.6 &mgr;m thick diamond layers deposited on silicon, providing an upper bound for the effective silicon‐diamond boundary resistance. The data agree with predictions that couple the local phonon scattering rate in the diamond to the grain size. ©1995 American Institute of Physics.
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